$E_g$ (energy band-gap) for silicon is greater than that for germanium. Therefore, it can be concluded that |
a greater number of electron hole pairs will be generated in silicon than in germanium at room temperature less number of electron hole pairs will be generated in silicon than in germanium at room temperature an equal number of electron hole pairs will be generated in both at lower temperatures an equal number of electron hole pairs will be generated in both at higher temperatures |
less number of electron hole pairs will be generated in silicon than in germanium at room temperature |
Correct answer: less number of electron-hole pairs will be generated in silicon than in germanium at room temperature Explanation: The number of thermally generated electron-hole pairs in a semiconductor depends exponentially on the energy band-gap (Eg). Since silicon has a larger band-gap (≈ 1.1 eV) compared to germanium (≈ 0.7 eV), it requires more energy to excite an electron from the valence band to the conduction band. Hence, at room temperature, fewer electron-hole pairs are generated in silicon than in germanium. |